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Strukturierungsmethoden

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Handbuch energiesparende Halbleiterbauelemente – Hochintegrierte Chips

Zusammenfassung

Zu den konventionellen Lithografieverfahren gehören die Foto-, EUV-, Röntgen-, Elektronenstrahl-und Ionenstrahllithografie. Foto-, EUV-, Röntgenlithografie und die Elektronenstrahlschattenwurfmetode sind parallele Verfahren, d. h., es können größere Substratflächen gleichzeitig belichtet werden. 

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Authors and Affiliations

  1. Esslingen am Neckar, Baden-Württemberg, Deutschland

    Hartmut Frey

  2. Stuttgart, Baden-Württemberg, Deutschland

    Engelbert Westkämper

  3. Forschungsfabrik Mikroelektronik, Langebrück, Deutschland

    Bernd Hintze

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Frey, H., Westkämper, E., Hintze, B. (2023). Strukturierungsmethoden. In: Handbuch energiesparende Halbleiterbauelemente – Hochintegrierte Chips. Springer Vieweg, Wiesbaden. https://doi.org/10.1007/978-3-658-39346-5_6

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