Tactras Vigus - Model 300mm - Plasma Etch System
From Etch System - Tactras Series
Tactras™ Vigus™ is a highly reliable 300mm plasma etch system that enhances etch process productivity. Scaling at advanced technology nodes makes the etch process more and more crucial. As the solution for etch process challenges, Tactras™ Vigus™ provides customized options for high aspect ratio holes, trench etch, mask and dielectric etch, and BEOL dielectric etch.
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Product Details
The common base product design allows, Tactras™ Vigus™ to be built for specific applications. Yield improvement is required even as the device structure is becoming more complex. To deliver etch requirements with high productivity, advanced design technologies have been implemented to achieve excellent wafer uniformity, low wafer-to-wafer variation and high selectivity for thin film stop layers while maintaining high etch rate. Up to 6 Vigus™ chambers can be installed on the Tactras™ platform. Tactras™ Vigus™ contributes to maximizing improve productivity for semiconductor manufactures with industry leading tool availability by minimizing offset in machine-to-machine and chamber-to-chamber with robust design, particle reduction techniques, introducing unit-assembly inspection method before shipment, and unique labor-saving automated functions.
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